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Study of microstructure and silicon segregation in cast iron using color etching and electron microprobe analysis
KTH, School of Industrial Engineering and Management (ITM), Materials Science and Engineering, Casting of Metals. Jönköping University, Sweden.
2015 (English)In: Materials Characterization, ISSN 1044-5803, E-ISSN 1873-4189, Vol. 104, 132-138 p.Article in journal (Refereed) Published
Abstract [en]

An investigation on silicon segregation of lamellar, compacted and nodular graphite iron was carried out by applying a selective, immersion color etching and a modified electron microprobe to study the microstructure. The color etched micrographs of the investigated cast irons by revealing the austenite phase have provided data about the chronology and mechanism of microstructure formation. Moreover, electron microprobe has provided two dimensional segregation maps of silicon. A good agreement was found between the segregation profile of silicon in the color etched microstructure and the silicon maps achieved by electron microprobe analysis. However, quantitative silicon investigation was found to be more accurate than color etching results to study the size of the eutectic colonies.

Place, publisher, year, edition, pages
2015. Vol. 104, 132-138 p.
Keyword [en]
Cast iron, Color etching, Electron microprobe analysis, Eutectic colony, Segregation
National Category
Metallurgy and Metallic Materials
Identifiers
URN: urn:nbn:se:kth:diva-166926DOI: 10.1016/j.matchar.2014.09.008Scopus ID: 2-s2.0-84928489872OAI: oai:DiVA.org:kth-166926DiVA: diva2:819083
Note

QC 20150610

Available from: 2015-06-10 Created: 2015-05-21 Last updated: 2017-12-04Bibliographically approved

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