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On reactive high power impulse magnetron sputtering
KTH, School of Electrical Engineering (EES), Space and Plasma Physics. University of Iceland, Iceland.
2015 (English)In: Plasma Physics and Controlled Fusion, ISSN 0741-3335, E-ISSN 1361-6587, Vol. 58, no 1Article in journal (Refereed) PublishedText
Abstract [en]

High power impulse magnetron sputtering (HiPIMS) is an ionized physical vapor deposition (IPVD) technique that is particularly promising for reactive sputtering applications. However, there are few issues that have to be resolved before the full potential of this technique can be realized. Here we give an overview of the key experimental findings for the reactive HiPIMS discharge. An increase in the discharge current is commonly observed with increased partial pressure of the reactive gas or decreased repetition pulse frequency. There are somewhat conflicting claims regarding the hysteresis effect in the reactive HiPIMS discharge as some report reduction or elimination of the hysteresis effect while others claim a feedback control is essential. The ion energy distribution of the metal ion and the atomic ion of the reactive gas are similar and extend to very high energies while the ion energy distribution of the working gas and the molecular ion of the reactive gas are similar and are much less energetic.

Place, publisher, year, edition, pages
Institute of Physics Publishing (IOPP), 2015. Vol. 58, no 1
Keyword [en]
high power impulse magnetron sputtering (HiPIMS), magnetron sputtering, oxidation, reactive sputtering
National Category
Fusion, Plasma and Space Physics
Identifiers
URN: urn:nbn:se:kth:diva-181982DOI: 10.1088/0741-3335/58/1/014002ISI: 000368471900003ScopusID: 2-s2.0-84949658065OAI: oai:DiVA.org:kth-181982DiVA: diva2:903175
Funder
VINNOVA, 2014-04876
Note

QC 20160215

Available from: 2016-02-15 Created: 2016-02-11 Last updated: 2016-02-24Bibliographically approved

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Gudmundsson, Jon Tomas
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