Colloidal self-organization for nanoelectronics
2004 (English)In: Proceedings ICSE 2004: 2004 IEEE International Conference on Semiconductor Electronics, IEEE , 2004, 146-148 p.Conference paper (Refereed)Text
The major part of the expenses in modern IC manufacturing process is nowadays devoted to the R&D needed to optimize chip size, wafer size, defecrivity and interconnects- building up to keep Moore's law a reality. But the question is: Can circuits with sub-0.1μm dimensions be fabricated by the extension of current device production technologies? An interdisciplinary 'off the beaten path' approach is mandatory to overcome future limitations. One such approach is fabrication of devices (or at least parts of devices) by self-organization.
Place, publisher, year, edition, pages
IEEE , 2004. 146-148 p.
Industrial engineering, International conferences, Self organizations, Semiconductor electronics, Electric conductivity
IdentifiersURN: urn:nbn:se:kth:diva-182962ISI: 000236760900002ScopusID: 2-s2.0-33645440853ISBN: 0780386582ISBN: 9780780386587OAI: oai:DiVA.org:kth-182962DiVA: diva2:914229
2004 IEEE International Conference on Semiconductor Electronics, ICSE 2004, 4 December 2004 through 9 December 2004, Kuala Lumpur
QC 201604012016-03-232016-02-242016-04-01Bibliographically approved