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Multilayered silicon/silicon nitride thin films deposited by plasma-CVD: Effects of crystallization
1995 (English)In: Nanostructured Materials, Vol. 6, no 5-8, 843-846 p.Article in journal (Refereed) Published
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1995. Vol. 6, no 5-8, 843-846 p.
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Nano Technology
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URN: urn:nbn:se:kth:diva-175302DOI: 10.1016/0965-9773(95)00191-3ScopusID: 2-s2.0-0029224422OAI: oai:DiVA.org:kth-175302DiVA: diva2:918263
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NR 20160411

Available from: 2016-04-11 Created: 2015-10-10 Last updated: 2016-04-11Bibliographically approved

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Dutta, Joydeep
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