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Comparison of the properties of hydrogenated microcrystalline silicon films deposited by photo-chemical-vapor deposition and glow-discharge deposition processes
1989 (English)In: Journal of Applied Physics, Vol. 66, no 10, 4709-4714 p.Article in journal (Refereed) Published
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1989. Vol. 66, no 10, 4709-4714 p.
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Nano Technology
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URN: urn:nbn:se:kth:diva-175312DOI: 10.1063/1.343829ScopusID: 2-s2.0-36549103325OAI: oai:DiVA.org:kth-175312DiVA: diva2:918267
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NR 20160411

Available from: 2016-04-11 Created: 2015-10-10 Last updated: 2016-04-11Bibliographically approved

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Dutta, Joydeep
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