2015 (English)In: SSS 2015 - 10th International Space Syntax Symposium, Space Syntax Laboratory, The Bartlett School of Architecture, University College London , 2015Conference paper (Refereed)Text
In the Social Logic of Space it is stated that spatial configuration affects social relations in how it structures patterns of movement, encounter and avoidance. Since then, a lot of space syntax research has investigated these phenomena to provide empirical support and to refine the understanding of mechanisms and relations. However, most of this research focuses on the first half of these patterns-that of how space structures and generates encounters, whereas studies of how space generates patterns of avoidance is less often studied. The outset of this paper is that in order to understand a 'social logic of space', the study of how space generates, allows, or prevents patterns of avoidance is a missing key question that may also further develop discourses of patterns of encounter. Avoidance, as a social action, simply requires a series of socio-spatial, interactive, and shared relations to and through space that necessitates assumptions, presumptions, and speculations of the behaviours of specific or generic others that studies of encounters at times can avoid. In extension, while a development rather than a challenge to studies of encounters, this informs knowledge on the relations between society, activity, and space in general, and on the socio-cultural structuring taking place in everyday spatial performativity.
Place, publisher, year, edition, pages
Space Syntax Laboratory, The Bartlett School of Architecture, University College London , 2015.
Avoidance, Encounter patterns, Performativity, Social structuring, Spatial behaviour, Spatial configuration
IdentifiersURN: urn:nbn:se:kth:diva-187516ScopusID: 2-s2.0-84959195919ISBN: 9780993342905OAI: oai:DiVA.org:kth-187516DiVA: diva2:937155
10th International Space Syntax Symposium, SSS 2015, 13 July 2015 through 17 July 2015
QC 201606152016-06-152016-05-252016-06-15Bibliographically approved