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Low-loss ridge waveguides in thin film lithium niobate-on-insulator (LNOI) fabricated by reactive ion etching
KTH, School of Engineering Sciences (SCI), Applied Physics, Quantum Electronics and Quantum Optics, QEO.ORCID iD: 0000-0001-7242-7300
KTH, School of Engineering Sciences (SCI), Applied Physics, Quantum Electronics and Quantum Optics, QEO.ORCID iD: 0000-0003-3252-3212
KTH, School of Engineering Sciences (SCI), Applied Physics, Quantum Electronics and Quantum Optics, QEO.ORCID iD: 0000-0001-7185-0457
2016 (English)In: ProceedingsĀ Advanced Photonics 2016, OSA Publishing , 2016Conference paper, Oral presentation with published abstract (Refereed)
Abstract [en]

We report on the fabrication of waveguides in 300 nm-thick Y-cut lithium niobate onsilicon through optimized reactive ion etching, yielding sidewall roughness of 22.9 nm andpropagation losses of 8.62 dB/cm at 1550 nm.

Place, publisher, year, edition, pages
OSA Publishing , 2016.
Keyword [en]
Lithium niobate, Integrated optics devices, Waveguides, Thin film devices and applications
National Category
Other Physics Topics
Research subject
Physics
Identifiers
URN: urn:nbn:se:kth:diva-192473DOI: 10.1364/IPRSN.2016.ITu1A.2OAI: oai:DiVA.org:kth-192473DiVA: diva2:968795
Conference
Advanced Photonics 2016 Congress
Note

QC 20160926

Available from: 2016-09-12 Created: 2016-09-12 Last updated: 2016-09-26Bibliographically approved

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Publisher's full texthttps://www.osapublishing.org/abstract.cfm?uri=IPRSN-2016-ITu1A.2

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