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Low-loss ridge waveguides in thin film lithium niobate-on-insulator (LNOI) fabricated by reactive ion etching
KTH, School of Engineering Sciences (SCI), Applied Physics, Quantum Electronics and Quantum Optics, QEO.ORCID iD: 0000-0001-7242-7300
KTH, School of Engineering Sciences (SCI), Applied Physics, Quantum Electronics and Quantum Optics, QEO.
KTH, School of Engineering Sciences (SCI), Applied Physics, Quantum Electronics and Quantum Optics, QEO.
2016 (English)In: ProceedingsĀ Advanced Photonics 2016, OSA Publishing , 2016Conference paper, Abstract (Refereed)
Abstract [en]

We report on the fabrication of waveguides in 300 nm-thick Y-cut lithium niobate onsilicon through optimized reactive ion etching, yielding sidewall roughness of 22.9 nm andpropagation losses of 8.62 dB/cm at 1550 nm.

Place, publisher, year, edition, pages
OSA Publishing , 2016.
Keyword [en]
Lithium niobate, Integrated optics devices, Waveguides, Thin film devices and applications
National Category
Other Physics Topics
Research subject
Physics
Identifiers
URN: urn:nbn:se:kth:diva-192473DOI: 10.1364/IPRSN.2016.ITu1A.2OAI: oai:DiVA.org:kth-192473DiVA: diva2:968795
Conference
Advanced Photonics 2016 Congress
Note

QC 20160926

Available from: 2016-09-12 Created: 2016-09-12 Last updated: 2016-09-26Bibliographically approved

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Publisher's full texthttps://www.osapublishing.org/abstract.cfm?uri=IPRSN-2016-ITu1A.2

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Baghban, Mohammad AminMahato, Sunil KumarGallo, Katia
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ReferencesLink to record
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