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  • 1.
    Abedin, Ahmad
    et al.
    KTH, School of Information and Communication Technology (ICT), Electronics, Integrated devices and circuits.
    Asadollahi, Ali
    KTH, School of Information and Communication Technology (ICT), Electronics, Integrated devices and circuits.
    Garidis, Konstantinos
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Hellström, Per-Erik
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Östling, Mikael
    KTH, School of Information and Communication Technology (ICT), Electronics.
    Epitaxial growth of Ge strain relaxed buffer on Si with low threading dislocation density2016In: ECS Transactions, Electrochemical Society, 2016, no 8, p. 615-621Conference paper (Refereed)
    Abstract [en]

    Epitaxial Ge with low dislocation density is grown on a low temperature grown Ge seed layer on Si substrate by reduced pressure chemical vapor deposition. The surface topography measured by AFM shows that the strain relaxation occurred through pit formation which resulted in freezing the defects at Ge/Si interface. Moreover a lower threading dislocation density compared to conventional strain relaxed Ge buffers on Si was observed. We show that by growing the first layer at temperatures below 300 °C a surface roughness below 1 nm can be achieved together with carrier mobility enhancement. The different defects densities revealed from SECCO and Iodine etching shows that the defects types have been changed and SECCO is not always trustable.

  • 2.
    Abedin, Ahmad
    et al.
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics, Integrated devices and circuits.
    Zurauskaite, Laura
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics, Integrated devices and circuits.
    Asadollahi, Ali
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics, Integrated devices and circuits. KTH.
    GOI fabrication for Monolithic 3D integrationIn: Article in journal (Other academic)
  • 3.
    Abedin, Ahmad
    et al.
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics.
    Zurauskaite, Laura
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics.
    Asadollahi, Ali
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics.
    Garidis, Konstantinos
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics.
    Jayakumar, Ganesh
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics.
    Malm, B. Gunnar
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics.
    Hellström, Per-Erik
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics.
    Östling, Mikael
    KTH, School of Electrical Engineering and Computer Science (EECS).
    Germanium on Insulator Fabrication for Monolithic 3-D Integration2018In: IEEE Journal of the Electron Devices Society, ISSN 2168-6734, Vol. 6, no 1, p. 588-593Article in journal (Refereed)
    Abstract [en]

    A low temperature (T-max = 350 degrees C) process for Germanium (Ge) on insulator (GOI) substrate fabrication with thicknesses of less than 25 nm is reported in this paper. The process is based on a single step epitaxial growth of a Ge/SiGe/Ge stack on Si, room temperature wafer bonding and an etch-back process using Si0.5Ge0.5 as an etch-stop layer. GOI substrates with surface roughness below 0.5 nm, 0.15% tensile strain, thickness nonuniformity of less than 3 nm and residual p-type doping of less than 1016 cm(-3) were fabricated. Ge pFETs are fabricated (T-max = 600 degrees C) on the GOI wafer with 70% yield. The devices exhibit a negative threshold voltage of -0.18 V and 60% higher mobility than the SOI pFET reference devices.

  • 4.
    Abedin, Ahmad
    et al.
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics.
    Zurauskaite, Laura
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics.
    Asadollahi, Ali
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics.
    Garidis, Konstantinos
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics.
    Jayakumar, Ganesh
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics.
    Malm, B. Gunnar
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics.
    Hellström, Per-Erik
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics.
    Östling, Mikael
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics.
    GOI fabrication for monolithic 3D integration2018In: 2017 IEEE SOI-3D-Subthreshold Microelectronics Unified Conference, S3S 2017, Institute of Electrical and Electronics Engineers (IEEE), 2018, Vol. 2018, p. 1-3Conference paper (Refereed)
    Abstract [en]

    A low temperature (Tmax=350 °C) process for Ge on insulator (GOI) substrate fabrication with thicknesses of less than 25 nm is reported in this work. The process is based on a single step epitaxial growth of a Ge/SiGe/Ge stack on Si, room temperature wafer bonding, and an etch-back process using Si0.5Ge0.5 as an etch-stop layer. Using this technique, GOI substrates with surface roughness below 0.5 nm, thickness nonuniformity of less than 3 nm, and residual p-type doping of less than 1016 cm-3 are achieved. Ge pFETs are fabricated (Tmax=600 °C) on the GOI wafer with 70% yield. The devices exhibit a negative threshold voltage of-0.18 V and 60% higher mobility than the SOI pFET reference devices.

  • 5.
    Asadollahi, Ali
    KTH, School of Electrical Engineering and Computer Science (EECS), Micro and Nanosystems. KTH.
    A Study of Surface Treatments and Voids Formation in Low Temperature Wafer BondingManuscript (preprint) (Other academic)
  • 6.
    Asadollahi, Ali
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics, Integrated devices and circuits. KTH.
    Compressive-Strained Ge and Tensile-Strained SiGe on Insulator Fabrication via Wafer Bonding for Monolithic 3D IntegrationManuscript (preprint) (Other academic)
  • 7.
    Asadollahi, Ali
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics, Integrated devices and circuits.
    Fabrication of Group IV Semiconductors on Insulator for Monolithic 3D Integration2018Doctoral thesis, comprehensive summary (Other academic)
    Abstract [en]

    The conventional 2D geometrical scaling of transistors is now facing many challenges in order to continue the performance enhancement while decreasing power consumption. The decrease in the device power consumption is related to the scaling of the power supply voltage (Vdd) and interconnects wiring length. In addition, monolithic three dimensional (M3D) integration in the form of vertically stacked devices, is a possible solution to increase the device density and reduce interconnect wiring length. Integrating strained germanium on insulator (sGeOI) pMOSFETs monolithically with strained silicon/silicon-germanium on insulator (sSOI/sSiGeOI) nMOSFETs can increase the device performance and packing density. Low temperature processing (<550 ºC) is essential as interconnects and strained layers limit the thermal budget in M3D. This thesis presents an experimental investigation of the low temperature (<450 ºC) fabrication of group IV semiconductor-on-insulator substrates with the focus on sGeOI and sSiGeOI fabrication processes compatible with M3D.

      To this aim, direct bonding was used to transfer the relaxed and strained semiconductor layers. The void formation dependencies of the oxide thickness, the surface treatment of the oxide and the post annealing time were fully examined. Low temperature SiGe epitaxy was investigated with the emphasis on the fabrication of Si0.5Ge0.5 strain-relaxed buffers (SRBs), etch-stop layer, and the device layer in the SiGeOI and GeOI process schemes. Ge epitaxial growth on Si as thick SRBs and thin device layers was investigated. Thick (500 nm-3 µm) and thin (<30 nm) relaxed GeOI substrates were fabricated. The latter was fabricated by continuous epitaxial growth of a 3-µm Ge (SRB)/Si0.5Ge0.5 (etch stop)/Ge (device layer) stack on Si. The fabricated long channel Ge pFETs from these GeOI substrates exhibit well-behaved IV characteristics with an effective mobility of 160 cm2/Vs.

      The planarization of SiO2 and SiGe SRBs for the fabrication of the strained GeOI and SiGeOI were accomplished by chemical mechanical polishing (CMP). Low temperature processes (<450 ºC) were developed for compressively strained GeOI layers (ɛ ~ -1.75 %, < 20 nm), which are used for high mobility and low power devices. For the first time, tensile strained Si0.5Ge0.5 (ɛ ~ 2.5 %, < 20 nm) films were successfully fabricated and transferred onto patterned substrates for 3D integration.

  • 8.
    Asadollahi, Ali
    KTH, School of Electrical Engineering and Computer Science (EECS), Electronics, Integrated devices and circuits. KTH.
    Low Temperature SiGe Epitaxy Using SiH4-GeH4and Si2H6-Ge2H6 Gas PrecursorsIn: Journal of Solid State Science and TechnologyArticle in journal (Other academic)
  • 9.
    Asadollahi, Ali
    et al.
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Radamson, Henry
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Zabel, Thomas
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Hellström, Per-Erik
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Östling, Mikael
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Fabrication of strained Ge on insulator via room temperature wafer bonding2014In: 2014 15th International Conference on Ultimate Integration on Silicon, ULIS 2014, IEEE Computer Society, 2014, p. 81-84Conference paper (Refereed)
    Abstract [en]

    This work describes a strained germanium on insulator (GeOI) fabrication process using wafer bonding and etch-back techniques. The strained Ge layer is fabricated epitaxially using reduced pressure chemical vapor deposition (RPCVD). The strained Ge is grown pseudomorphic on top of a partially relaxed Si 0.66Ge0.34 layer. Wafer bonding is performed at room temperature without post-anneal processes and the etch-back steps are performed without mechanical grinding and chemical mechanical polishing (CMP).

  • 10.
    Asadollahi, Ali
    et al.
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Zabel, Thomas
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Roupillard, Gabriel
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Radamson, Henry H.
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Hellström, Per-Erik
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Östling, Mikael
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Fabrication of relaxed germanium on insulator via room temperature wafer bonding2014In: ECS Transactions: Volume 64, Cancun, Mexico, October 5 – 9, 2014 2014 ECS and SMEQ Joint International Meeting, Electrochemical Society, 2014, no 6, p. 533-541Conference paper (Refereed)
    Abstract [en]

    We report on the fabrication of, high quality, monocrystalline relaxed Germanium with ultra-low roughness on insulator (GeOI) using low-temperature direct wafer bonding. We observe that a two-step epitaxially grown germanium film fabricated on silicon by reduced pressure chemical vapor deposition can be directly bonded to a SiO2 layer using a thin Al2O3 as bonding mediator. After removing the donor substrate silicon the germanium layer exhibits a complete relaxation without degradation in crystalline quality and no stress in the film. . The results suggest that the fabricated high quality GeOI substrate is a suitable platform for high performance device applications.

  • 11.
    Elahipanah, Hossein
    et al.
    KTH, School of Information and Communication Technology (ICT), Electronics, Integrated devices and circuits.
    Asadollahi, Ali
    KTH, School of Information and Communication Technology (ICT), Electronics, Integrated devices and circuits.
    Ekström, Mattias
    KTH, School of Information and Communication Technology (ICT), Electronics.
    Salemi, Arash
    KTH, School of Information and Communication Technology (ICT), Electronics.
    Zetterling, Carl-Mikael
    KTH, School of Information and Communication Technology (ICT), Electronics, Integrated devices and circuits.
    Östling, Mikael
    KTH, School of Information and Communication Technology (ICT), Electronics, Integrated devices and circuits.
    A wafer-scale Ni-salicide contact technology on n-type 4H-SiC2017In: ECS Journal of Solid State Science and Technology, ISSN 2162-8769, E-ISSN 2162-8777, Vol. 6, no 4, p. P197-P200Article in journal (Refereed)
    Abstract [en]

    A self-aligned Nickel (Ni) silicide process (Salicide) for n-type ohmic contacts on 4H-SiC is demonstrated and electrically verified in a wafer-scale device process. The key point is to anneal the contacts in two steps. The process is successfully employed on wafer-level and a contact resistivity below 5 × 10−6 Ω · cm2 is achieved. The influence of the proposed process on the oxide quality is investigated and no significant effect is observed. The proposed self-aligned technology eliminates the undesirable effects of the lift-off process. Moreover, it is simple, fast, and manufacturable at wafer-scale which saves time and cost.

  • 12.
    Elahipanah, Hossein
    et al.
    KTH, School of Information and Communication Technology (ICT), Electronics.
    Asadollahi, Ali
    KTH, School of Information and Communication Technology (ICT), Electronics.
    Ekström, Mattias
    KTH, School of Information and Communication Technology (ICT), Electronics.
    Salemi, Arash
    KTH, School of Information and Communication Technology (ICT), Electronics.
    Zetterling, Carl-Mikael
    KTH, School of Information and Communication Technology (ICT), Electronics.
    Östling, Mikael
    KTH, School of Information and Communication Technology (ICT), Electronics.
    A Wafer-Scale Self-Aligned Ni-Silicide (SALICIDE) Low-Ohmic Contact Technology on n-type 4H-SiC2017In: ECS Journal of Solid State Science and Technology, ISSN 2162-8769, E-ISSN 2162-8777, Vol. 6, no 4, p. 197-200Article in journal (Refereed)
    Abstract [en]

    A self-aligned nickel (Ni) silicide process for n-type Ohmic contacts on 4H-SiC is demonstrated and electrically verified in a wafer-scale device process. The key point is to anneal the contacts in two steps. The process is successfully employed on wafer-level and a contact resistivity below 5×10-6 Ω·cm2 is achieved. The influence of the proposed process on the oxide quality is investigated and no significant effect is observed. The proposed self-aligned technology eliminates the undesirable effects of the lift-off process. Moreover, it is simple, fast, and manufacturable at wafer-scale, which saves time and cost.

  • 13.
    Garidis, Konstantinos
    et al.
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Jayakumar, Ganesh
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Asadollahi, Ali
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Dentoni Litta, Eugenio
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Hellström, Per-Erik
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Östling, Mikael
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Characterization of bonding surface and electrical insulation properties of inter layer dielectrics for 3D monolithic integration2015In: EUROSOI-ULIS 2015 - 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, 2015, p. 165-168Conference paper (Refereed)
    Abstract [en]

    We investigate the bonding and electrical insulation properties of oxide layers for use in 3D monolithic integration via direct wafer bonding. Low surface roughness layers deposited on 100 mm Si wafers by atomic layer deposition (ALD) at 200 °C-350 °C, provide with adequate layer transfer bonding interfaces. Wafer scale IV measurements were performed to investigate the leakage current. We demonstrate that ALD oxide can function as a reliable bonding surface and also exhibit leakage current values below the nA range. Both properties are important pillars for a successful 3D monolithic integration.

  • 14.
    Jayakumar, Ganesh
    et al.
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Asadollahi, Ali
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Hellström, Per-Erik
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Garidis, Konstantinos
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Östling, Mikael
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Silicon Nanowires Integrated in a Fully Depleted CMOS Process for Charge Based Biosensing2013In: ULIS 2013: The 14th International Conference on Ultimate Integration on Silicon, Incorporating the 'Technology Briefing Day', IEEE , 2013, p. 81-84Conference paper (Refereed)
    Abstract [en]

    We describe a silicon nanowire (SiNW) biosensor fabricated in a fully depleted SOI CMOS process. The sensor array consists of 32 by 32 pixel matrix (1024 pixels or test sites) and 8 input-output (I/O) pins. In each pixel single crystalline SiNW with 60 by 20 nm cross-section area is defined using sidewall transfer lithography (STL) in the SOI layer. The key advantage of the design is that 1024 individual SiNWs can be read-out sequentially and used for real-time charge based detection of molecules in liquids or gases.

  • 15.
    Jayakumar, Ganesh
    et al.
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Asadollahi, Ali
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Hellström, Per-Erik
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Garidis, Konstantinos
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Östling, Mikael
    KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
    Silicon nanowires integrated with CMOS circuits for biosensing application2014In: Solid-State Electronics, ISSN 0038-1101, E-ISSN 1879-2405, Vol. 98, p. 26-31Article in journal (Refereed)
    Abstract [en]

    We describe a silicon nanowire (SiNW) biosensor fabricated in a fully depleted SOI CMOS process. The sensor array consists of N by N pixel matrix (N-2 pixels or test sites) and 8 input-output (I/O) pins. In each pixel a single crystalline SiNW with 75 by 20 nm cross-section area is defined using sidewall transfer lithography in the SOI layer. The key advantage of the design is that each individual SiNWs can be read-out sequentially and used for real-time charge based detection of molecules in liquids or gases.

1 - 15 of 15
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  • harvard1
  • ieee
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