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Mahadeva, S. K., Fan, J., Biswas, A., Rao, G. M., Sreelatha, K. S., Belova, L. & Rao, K. V. (2013). A comparative study of room temperature ferromagnetism in MgO films deposited by rf/dc sputtering using high purity Mg and MgO targets. Materials Express, 3(4), 328-334
Open this publication in new window or tab >>A comparative study of room temperature ferromagnetism in MgO films deposited by rf/dc sputtering using high purity Mg and MgO targets
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2013 (English)In: Materials Express, ISSN 2158-5849, Vol. 3, no 4, p. 328-334Article in journal (Refereed) Published
Abstract [en]

Thin films of nanocrystalline MgO were deposited on glass/Si substrates by rf/dc sputtering from metallic Mg, and ceramic MgO targets. The purpose of this study is to identify the differences in the properties, magnetic in particular, of MgO films obtained on sputter deposition from 99.99% pure metallic Mg target in a controlled [Nitrogen + Oxygen partial pressure (O(2)pp)] atmosphere as against those deposited using an equally pure ceramic MgO target in argon + identical oxygen ambience conditions while maintaining the same total pressure in the chamber in both cases. Characterization of the films was carried out by X-ray diffraction, focussed ion beam cross sectioning, atomic force microscopy and SQUID-magnetometry. The 'as-obtained' films from pure Mg target are found to be predominantly X-ray amorphous, while the ceramic MgO target gives crystalline films, (002) oriented with respect to the film plane. The films consisted of nano-crystalline grains of size in the range of about 0.4 to 4.15 nm with the films from metallic target being more homogeneous and consisting of mostly subnanometer grains. Both the types of films are found to be ferromagnetic to much above room temperature. We observe unusually high maximum saturation magnetization (MS) values of 13.75 emu/g and similar to 4.2 emu/g, respectively for the MgO films prepared from Mg, and MgO targets. The origin of magnetism in MgO films is attributed to Mg vacancy (V-Mg), and 2p holes localized on oxygen sites. The role of nitrogen in enhancing the magnetic moments is also discussed.

Keywords
Magnetron Sputtering, Metallic Mg and MgO Targets, d(0)-Ferromagnetism, Saturation, Magnetization, Mg Vacancy, Nitrogen
National Category
Metallurgy and Metallic Materials
Identifiers
urn:nbn:se:kth:diva-138357 (URN)10.1166/mex.2013.1131 (DOI)000327450700006 ()2-s2.0-84887705630 (Scopus ID)
Funder
VinnovaCarl Tryggers foundation
Note

QC 20140107

Available from: 2014-01-07 Created: 2013-12-19 Last updated: 2024-03-18Bibliographically approved
Mahadeva, S. K., Fan, J., Biswas, A., Sreelatha, K. S., Belova, L. & Rao, K. . (2013). Magnetism of amorphous and nanocrystalized dc-sputter-deposited MgO Thin Films. Nanomaterials, 3(3), 486-497
Open this publication in new window or tab >>Magnetism of amorphous and nanocrystalized dc-sputter-deposited MgO Thin Films
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2013 (English)In: Nanomaterials, E-ISSN 2079-4991, Vol. 3, no 3, p. 486-497Article in journal (Refereed) Published
Abstract [en]

We report a systematic study of room-temperature ferromagnetism (RTFM) in pristine MgO thin films in their amorphous and nano-crystalline states. The as deposited dc-sputtered films of pristine MgO on Si substrates using a metallic Mg target in an O-2 containing working gas atmosphere of (N-2 + O-2) are found to be X-ray amorphous. All these films obtained with oxygen partial pressure (P-O2) similar to 10% to 80% while maintaining the same total pressure of the working gas are found to be ferromagnetic at room temperature. The room temperature saturation magnetization (MS) value of 2.68 emu/cm(3) obtained for the MgO film deposited in P-O2 of 10% increases to 9.62 emu/cm3 for film deposited at P-O2 of 40%. However, the MS values decrease steadily for further increase of oxygen partial pressure during deposition. On thermal annealing at temperatures in the range 600 to 800 degrees C, the films become nanocrystalline and as the crystallite size grows with longer annealing times and higher temperature, MS decreases. Our study clearly points out that it is possible to tailor the magnetic properties of thin films of MgO. The room temperature ferromagnetism in MgO films is attributed to the presence of Mg cation vacancies.

Keywords
room temperature ferromagnetism, Mg vacancy, magnetron sputtering, O-2 content; annealing
National Category
Metallurgy and Metallic Materials
Identifiers
urn:nbn:se:kth:diva-122628 (URN)10.3390/nano3030486 (DOI)000342201300009 ()28348346 (PubMedID)2-s2.0-84908567491 (Scopus ID)
Note

QC 20150626. Updated from manuscript to article in journal.

Available from: 2013-05-24 Created: 2013-05-24 Last updated: 2024-03-18Bibliographically approved
Masood, A., Biswas, A., Ström, V., Belova, L., Ågren, J. & Rao, K. V. (2011). The effect of Ni-substitution on physical Properties of Fe72-xB24Nb4Nix Bulk Metallic Glassy Alloys. In: MRS Proceedings, Volume 1300, 2011: . Paper presented at Materials Research Society, April 25 - 29, 2011, Moscone West Convention Center - San Francisco, California. Materials Research Society
Open this publication in new window or tab >>The effect of Ni-substitution on physical Properties of Fe72-xB24Nb4Nix Bulk Metallic Glassy Alloys
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2011 (English)In: MRS Proceedings, Volume 1300, 2011, Materials Research Society, 2011Conference paper, Oral presentation with published abstract (Refereed)
Abstract [en]

We have succeeded in producing bulk metallic glass by partial substitution of Fe with Ni in Fe-B-Nb alloys which could otherwise be only melt spun into amorphous ribbons. Substitution by Ni in the Fe72-xB24Nb4Nix alloys with (x ~2, 4, 6, 8, 10, 12 and 14) improves the glass forming ability of the materials and as a result rods of same compositions can be fabricated. Magnetically the BMG alloys remain soft with coercivity below 500mOe. However, the electrical resistivity of the system decreases significantly by as much as a factor of two with the increase of Ni concentration, and becomes more metallic like with a positive temperature coefficient. 

Place, publisher, year, edition, pages
Materials Research Society, 2011
Keywords
metal, magnetic, amorphous
National Category
Metallurgy and Metallic Materials
Identifiers
urn:nbn:se:kth:diva-101829 (URN)10.1557/opl.2011.304 (DOI)2-s2.0-84859062782 (Scopus ID)
Conference
Materials Research Society, April 25 - 29, 2011, Moscone West Convention Center - San Francisco, California
Projects
Hero-m
Funder
Vinnova
Note

QC 20120906

Available from: 2012-09-06 Created: 2012-09-05 Last updated: 2024-03-15Bibliographically approved
Biswas, A., Shirong, W., Nagar, S., Belova, L. & Rao, K. V. (2011). The effect of oxygen partial pressure during deposition in the magnetic properties of ZnO thin film. In: Mater Res Soc Symp Proc: . Paper presented at 2010 MRS Fall Meeting, 29 November 2010 through 3 December 2010, Boston, MA (pp. 117-122).
Open this publication in new window or tab >>The effect of oxygen partial pressure during deposition in the magnetic properties of ZnO thin film
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2011 (English)In: Mater Res Soc Symp Proc, 2011, p. 117-122Conference paper, Published paper (Refereed)
Abstract [en]

We have studied the magnetic properties of 100 nm thick ZnO thin films prepared by magnetron sputtering in different oxygen partial pressures (ratio of oxygen pressure to total pressure in deposition chamber, P Oxy). Only the films fabricated at P Oxy below ∼ 0.5 show room temperature ferromagnetism. The saturation magnetization at room temperature is initially found to increase as P Oxy increases and reaches maximum value of ∼ 5 emu/gm at P Oxy ∼ 0.3 and then starts to decrease and becomes diamagnetic for P Oxy > 0.5. From small angle XRD study of structural properties of the films, we find that the lattice stress developed in the film along c-axis also exhibits a similar behavior with the variation of P Oxy. Thus, both the room temperature ferromagnetism and lattice stress appear to originate from the intrinsic defects present in the sample.

Series
Materials Research Society Symposium Proceedings, ISSN 0272-9172 ; 1292
Keywords
Deposition chambers, Effect of oxygen, Intrinsic defects, Lattice stress, Maximum values, Oxygen partial pressure, Oxygen pressure, Room temperature, Room temperature ferromagnetism, Total pressure, XRD studies, ZnO thin film, Deposition, Ferromagnetism, Magnetic properties, Metallic films, Optical films, Oxide films, Oxygen, Partial pressure, Pressure effects, Saturation magnetization, Thin films, Vapor deposition, Zinc oxide, Magnetic thick films
National Category
Materials Engineering Other Physics Topics
Identifiers
urn:nbn:se:kth:diva-150741 (URN)10.1557/opl.2011.22 (DOI)2-s2.0-80053191847 (Scopus ID)9781605112695 (ISBN)
Conference
2010 MRS Fall Meeting, 29 November 2010 through 3 December 2010, Boston, MA
Note

QC 20140911

Available from: 2014-09-11 Created: 2014-09-09 Last updated: 2024-03-15Bibliographically approved
Kapilashrami, M., Xu, J., Biswas, A., Tamaki, T., Sharma, P., Rao, K. V. & Belova, L. (2010). Coexistence of ultraviolet photo-response and room-temperature ferromagnetism in polycrystalline ZnO thin films. Materials letters (General ed.), 64(11), 1291-1294
Open this publication in new window or tab >>Coexistence of ultraviolet photo-response and room-temperature ferromagnetism in polycrystalline ZnO thin films
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2010 (English)In: Materials letters (General ed.), ISSN 0167-577X, E-ISSN 1873-4979, ISSN 0167-577X, Vol. 64, no 11, p. 1291-1294Article in journal (Refereed) Published
Abstract [en]

The coexistence of ultraviolet (UV) photoconductivity (PC) and room-temperature ferromagnetism (RTFM) is observed in polycrystalline ZnO thin films deposited by unbalanced magnetron sputtering under high oxygen pressure. A significant increase in PC (similar to 870% to 40000%) is observed with increasing film thickness and the consequent structural disorder and film porosity. In contrast, the saturation magnetization (M(S)) at room temperature is found to decrease from 1.02 emu/g to 0.53 emu/g with increasing film thickness from 50 to 150 nm.

Keywords
Photoconductivity, Room-temperature ferromagnetism, Unbalanced magnetron sputtering
National Category
Materials Engineering
Identifiers
urn:nbn:se:kth:diva-14177 (URN)10.1016/j.matlet.2010.03.011 (DOI)000278148900014 ()2-s2.0-77950516143 (Scopus ID)
Funder
Swedish Foundation for Strategic ResearchVinnovaSwedish Research CouncilCarl Tryggers foundation
Note

QC 20100722

Available from: 2010-07-22 Created: 2010-07-22 Last updated: 2024-03-18Bibliographically approved
Organisations
Identifiers
ORCID iD: ORCID iD iconorcid.org/0000-0003-1733-3082

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