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2026 (English)In: Nature Communications, E-ISSN 2041-1723, Vol. 17, no 1, article id 6201Article in journal (Refereed) Published
Abstract [en]
Micro- and nanoscale patterning of conformal thin-film coatings on the exterior surfaces of complex three-dimensional (3D) structures is essential for emerging applications such as soft robotics, photonics, and functional 3D-printed MEMS devices. However, existing methods struggle to deliver high-resolution patterning on complex 3D structures and often suffer from poor thickness control, and inadequate surface conformity of the thin-film coatings. Here we present a robust approach for patterning of conformal thin-film coatings on complex 3D structures, including on sloped surfaces with angles up to 90°, with multiscale dimensions from 100 μm to 100 nm, and even down to the sub-30 nm scale when mask shrinkage techniques are used. This patterning approach utilizes a lithographically defined 3D Scaffold-Architected Lift-Off (SALO) mask in the lift-off process. It is agnostic to the used thin-film deposition process and enables even lift-off patterning of atomic layer deposited (ALD) conformal coatings, a task infeasible for conventional shadowing-based lift-off processes. Our approach opens opportunities for manufacturing complex 3D structures at the micro- and nanoscale by enabling lithographic patterning on the exterior surfaces of arbitrary 3D structures.
Place, publisher, year, edition, pages
Springer Nature, 2026
National Category
Other Materials Engineering
Identifiers
urn:nbn:se:kth:diva-386088 (URN)10.1038/s41467-026-75538-z (DOI)42448711 (PubMedID)2-s2.0-105044534369 (Scopus ID)
Note
QC 20260724
2026-07-242026-07-242026-07-24Bibliographically approved