In nano-electronics industries, the wastewater from Chemical Mechanical Planarization (CMP) process is subjected to a special treatment due to the presence of abrasive chemicals (silica and alumina) and metal deposits (tungsten, copper and aluminum), in order to achieve effluent discharge requirements and to allow for recycling of deionized water. Therefore, the challenge faced by imec (Belgium) is to treat the CMP wastewater properly in an environmental friendly and economical manner by reducing discharge volumes of CMP wastewater, and recovering and recycling the clean water. In this regard, we proposed a novel CMP wastewater treatment method based on using membrane distillation technology. Membrane distillation (MD) is a promising thermally driven technology which is capable to achieve extremely high environmental performance while using waste heat sources. For this study, Xzero Air Gap Membrane Distillation (AGMD) lab unit has been employed to treat the CMP wastewater and to reuse the MD treated water (deionized water).  The wastewater samples are collected and analyzed in imec whereas tested at Xzero AB. During the tests, composition, concentration, pH, conductivity, total organic carbon (TOC), total dissolved solid (TDS) and chemical oxygen demand (COD) of feed, concentrate and permeate has been measured. The neutralization step was performed as a pretreatment prior to MD separation process.The results show that high quality water was recovered having major contaminants (silica, alumina, copper, aluminum and tungsten) concentration below the detection limit, conductivity ~ 2.11 μS/cm, pH~5.4, TOC~1.13 ppm, IC~0.247 ppm, TDS~1.38 ppm, COD~1.11 ppm. Based on the obtained results, it is clear that disposing the MD treated wastewater into water bodies is not only acceptable under environmental regulations but can also be reused further. The CMP wastewater volumes are reduced up to 4 times, as well. In addition, the proposed technology is tolerant to many treatment conditions as compared to the conventional treatment.