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Penetration of corrosive species into copper exposed to simulated O2-free groundwater by time-of-flight secondary ion mass spectrometry (ToF-SIMS)
KTH, School of Engineering Sciences in Chemistry, Biotechnology and Health (CBH), Chemistry, Surface and Corrosion Science.ORCID iD: 0000-0002-6218-2108
Chalmers Univ Technol, Dept Chem & Chem Engn, Gothenburg, Sweden..
VTT Tech Res Ctr Finland Ltd, Espoo, Finland..
VTT Tech Res Ctr Finland Ltd, Espoo, Finland..ORCID iD: 0000-0002-3402-2414
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2023 (English)In: Corrosion Science, ISSN 0010-938X, E-ISSN 1879-0496, Vol. 210, p. 110833-, article id 110833Article in journal (Refereed) Published
Abstract [en]

ToF-SIMS analysis of copper samples after exposures to simulated groundwater with and without sulfide addition was performed to investigate the penetration of corrosive species containing H, S, O, and Cl, into copper. Depth profiles show extent of penetration and 2D/3D images reveal local elemental distribution of the corrosive species at different depths inside copper. Pre-oxidation did not reduce the penetration while sulfide additional in groundwater and exposure at 60 degrees C significantly promoted the penetration. The extent of penetration of the corrosive species into copper demonstrates the need for risk assessment of complex corrosion forms such as sulfide-induced embrittlement and cracking.

Place, publisher, year, edition, pages
Elsevier BV , 2023. Vol. 210, p. 110833-, article id 110833
Keywords [en]
Copper, Anoxic corrosion, Sulfide, ToF-SIMS, Nuclear waste
National Category
Metallurgy and Metallic Materials
Identifiers
URN: urn:nbn:se:kth:diva-323036DOI: 10.1016/j.corsci.2022.110833ISI: 000903715600001Scopus ID: 2-s2.0-85143213802OAI: oai:DiVA.org:kth-323036DiVA, id: diva2:1725896
Note

QC 20230112

Available from: 2023-01-12 Created: 2023-01-12 Last updated: 2024-05-02Bibliographically approved

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Yue, XiaoqiLeygraf, ChristopherPan, Jinshan

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