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Co-Adsorption of Formic Acid and Hexane Selenol on Cu
KTH, School of Engineering Sciences (SCI), Applied Physics, Light and Matter Physics.ORCID iD: 0000-0002-6785-8293
KTH, School of Engineering Sciences (SCI), Applied Physics.
Krefeld Research Centre, Outokumpu Nirosta GmbH, Krefeld, 47807, Germany.
KTH, School of Engineering Sciences in Chemistry, Biotechnology and Health (CBH), Chemistry, Surface and Corrosion Science.ORCID iD: 0000-0002-9453-1333
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2025 (English)In: Corrosion and Materials Degradation, E-ISSN 2624-5558, Vol. 6, no 4, article id 48Article in journal (Refereed) Published
Abstract [en]

Self-assembled monolayers of alkane thiolate and alkane selenolate have been proven to inhibit atmospheric corrosion, but upon prolonged exposure to the important constituents of indoor atmosphere, namely humidified air with formic acid, the protective layer eventually breaks, but the exact reason is not yet clear. In this paper, we report on an XPS study of co-adsorbed formic acid and hexane selenol on a Cu surface. Adsorption of hexane selenol at room temperature breaks the Se-C bond, leaving a monolayer of Se on the surface, whereas adsorption at 140 K leaves a layer of selenolate. Formic acid exposure to the selenolate-Cu surface leads to adsorbed formate on unprotected areas and absorption of formic acid within the alkane chain network. During heating, the formic acid desorbs and the Se-C bond breaks, but formic acid does not accelerate the Se-C scission, which occurs just below room temperature both with and without formic acid. Thus, formic acid alone does not affect the Se-C bond, but its presence may create disorder and open up the alkane carpet for other species. Selenol removes formate and oxide from the surface at room temperature. The Se-C bond breaks and the alkane chain reacts with surface oxygen to form carbon oxides and volatile hydrocarbons.

Place, publisher, year, edition, pages
MDPI AG , 2025. Vol. 6, no 4, article id 48
Keywords [en]
copper, corrosion protection, formic acid, hexane selenol, XPS
National Category
Chemical Sciences
Identifiers
URN: urn:nbn:se:kth:diva-374962DOI: 10.3390/cmd6040048ISI: 001646215200001Scopus ID: 2-s2.0-105025881987OAI: oai:DiVA.org:kth-374962DiVA, id: diva2:2027014
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QC 20260112

Available from: 2026-01-12 Created: 2026-01-12 Last updated: 2026-01-12Bibliographically approved

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Göthelid, MatsGötelid, Sareh AhmadiLeygraf, ChristopherJohnson, C. Magnus

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