A fundamental understanding of the oxidation mechanisms of aluminum (Al) alloys is of great importance for its applications in corrosion, catalysis, sensors, etc. In this work, we systematically investigated the first-stage oxidation behaviors of three low-index Al facets with O coverage up to two monolayers (ML) by using density-functional theory (DFT). The large negative adsorption energies indicated favorable oxidation on all three facets. However, distinctive structural and electronic changes induced by the adsorption of oxygen have led to different oxidation modes. More specifically, the oxidation process proceeded by "intercalating" into the subsurface region along the (111) plane out of the (110) facet with spontaneous O ingress into (110) far below one ML, as revealed by the electron density distribution, whereas the oxide ad-layer grew in a "layer-by-layer" mode on Al(111) and (001) facets. Moreover, various Al-O complexes with different atomic coordination numbers (CN), configurations, and sizes may be indicators of the tendency of an Al surface to be oxidized. Besides, the oxide phases formed on (111)/(001) and (110) assembled the Al-O bond distribution within alpha-Al2O3 and gamma-Al(2)O3, respectively.