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Insulator Polymer Matrix Construction on All-Small-Molecule Photoactive Blend Towards Extrapolated 15000 Hour T80 Stable Devices
Department of Electrical and Electronic Engineering, Research Institute for Smart Energy (RISE), Photonic Research Institute (PRI), The Hong Kong Polytechnic University, Hong Kong, China.
Deutsches Elektronen-Synchrotron (DESY), Notkestraße 85, 22607, Hamburg, Germany.
Advanced Materials Thrust, Function Hub, The Hong Kong University of Science and Technology, Nansha, Guangzhou, China, Nansha; Department of Applied Physics, The Hong Kong Polytechnic University, Hong Kong, China.
Xiamen Key Laboratory of Optoelectronic Materials and Advanced Manufacturing, Institute of Luminescent Materials and Information Displays, College of Materials Science and Engineering, Huaqiao University, Xiamen, 361021, China.
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2024 (English)In: Advanced Materials, ISSN 0935-9648, E-ISSN 1521-4095, Vol. 36, no 35, article id 2405005Article in journal (Refereed) Published
Abstract [en]

To boost the stability of all-small-molecule (ASM) organic photovoltaic (OPV) blends, an insulator polymer called styrene-ethylene-butylene-styrene (SEBS) as morphology stabilizer is applied into the host system of small molecules BM-ClEH:BO-4Cl. Minor addition of SEBS (1 mg/ml in host solution) provides a significantly enhanced T80 value of 15000 hours (extrapolated), surpassing doping-free (0 mg/ml) and heavy doping (10 mg/ml) counterparts (900 hours, 30 hours). The material reproducibility and cost-effectiveness of the active layer will not be affected by this industrially available polymer, where the power conversion efficiency (PCE) can be well maintained at 15.02%, which is still a decent value for non-halogen solvent-treated ASM OPV. Morphological and photophysical characterizations clearly demonstrate SEBS's pivotal effect on suppressing the degradation of donor molecules and blend film's crystallization/aggregation reorganization, which protects the exciton dynamics effectively. This work pays meaningful attention to the ASM system stability, performs a smart strategy to suppress the film morphology degradation, and releases a comprehensive understanding of the mechanism of device performance reduction.

Place, publisher, year, edition, pages
Wiley , 2024. Vol. 36, no 35, article id 2405005
Keywords [en]
additive, all-small-molecule, morphology, organic photovoltaic, stability
National Category
Materials Chemistry
Identifiers
URN: urn:nbn:se:kth:diva-366648DOI: 10.1002/adma.202405005ISI: 001271269700001PubMedID: 38992998Scopus ID: 2-s2.0-85198044030OAI: oai:DiVA.org:kth-366648DiVA, id: diva2:1982795
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QC 20250708

Available from: 2025-07-08 Created: 2025-07-08 Last updated: 2025-07-08Bibliographically approved

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Roth, Stephan V.

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