Solid-state nanopores in ultrathin (<20 nm) membranes enable label-free single-molecule sensing, but their adoption as sensors is limited by the lack of scalable manufacturing methods that deliver nanopores with single-nanometer reproducibility. Self-limiting metal-assisted chemical etching (MACE) in silicon-on-insulator (SOI) membranes offers a parallel wet-chemical route for nanopore fabrication, yet prior demonstrations lacked a predictive design rule and required electron microscopy or electrical tests for confirming presence and number of pores. Here, we convert self-limiting MACE into a manufacturing-oriented workflow with optical process control to obtain and verify the formation of 4 nm nanopores in a scalable fashion. We decouple the deposition of 200 +/- 10 nm gold (Au) nanoparticles from etching, enabling independent optimization of the two steps. The nanoparticle size allows for particle-per-membrane counting by dark-field optical microscopy, so that deposition can be repeated when counts are below target. We then map etching behavior across Au nanoparticle diameter d (10-200 nm) and silicon (Si) device-layer thickness t (5-18 nm), finding that d/t >= 0.8 ratio predicts self-limiting MACE behavior, where pore diameter becomes independent of particle size. In this regime, 200 +/- 10 nm catalysts yield 4 +/- 1 nm pores, corresponding to a reduction of similar to 50 & times; in pore diameter and similar to 10 & times; in pore-diameter variability compared to the catalyst diameter and related variability. Successful through-membrane pore formation produces undercuts in the buried oxide (typically similar to 200-300 nm diameter) beneath each pore, which can be characterized for each membrane by bright-field microscopy and used as a proxy for the otherwise optically invisible 4 nm pores. Together, the predictive d/t framework and two-stage optical verification establish a scalable wet-chemical route to fabricate nanopores for biomolecular sensing and related nanofluidic devices.